| 摘要 |
PURPOSE:To obtain the title polymer having a sharp MW distribution and being useful as a high-resolution radiation-sensitive resist base in excellent yields and reproducibility, by polymerizing a monomer in a solvent in the presence of a specified polymerization initiator under cooling at low temperature. CONSTITUTION:The title polymer of an MW of 20000-1000000 is obtained by polymerizing an alpha-cyanoacrylate of the formula (wherein R is a C1-12 alkyl, haloalkyl, cycloalkyl, alkenyl, alkoxyalkyl, allyl or the like) in a solvent such as acetone, ethyl acetate, cyclohexanone or trichloroethylene in the presence of 0.01-2.0mol% (based on the monomer) anionic polymerization initiator comprising a weak anionic polymerization initiator such as an organic amine, organic amide, phosphine, thiourea, thioalcohol or ether or a mixture thereof under cooling to 20--120 deg.C. |
