发明名称 |
Superlattice semiconductor device |
摘要 |
If superlattice semiconductor devices are to be used in highly integrated circuits, the available area for the superlattice semiconductor device is rendered too small. The aim is therefore to provide a possibility for using reliable superlattice semiconductor devices in highly integrated circuits as well. The superlattice semiconductor device according to the invention has superlattice layers (4a, 4a', 5a) which are coated one above another on the entire surface of a trench (20) formed in a semiconductor substrate or on the entire surface of a convex region formed on a surface of the semiconductor substrate. Such superlattice devices can be used, in particular, in resonant tunnel devices. <IMAGE>
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申请公布号 |
DE3802065(A1) |
申请公布日期 |
1989.02.02 |
申请号 |
DE19883802065 |
申请日期 |
1988.01.25 |
申请人 |
MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP |
发明人 |
KIMURA, MIKIHIRO, ITAMI, HYOGO, JP |
分类号 |
H01L29/201;H01L21/20;H01L21/331;H01L29/06;H01L29/41;H01L29/73;H01L29/737;H01L29/88;H01L31/0352;H01L31/10;H01L31/107;H01L49/00 |
主分类号 |
H01L29/201 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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