发明名称 |
Controlled flow vaporizer. |
摘要 |
<p>A vaporizing apparatus 71 delivers precisely controlled, substantially continuous and monitored vapor flows for uses such as in plasma enhanced vapor deposition. The vaporizing apparatus comprises a fluid passageway 212 along which are a pumping means 220, a vaporizing means 226 and a flowing means 260 all in fluid communication with the passageway. The vaporizing means 226 vaporizes liquid pumped from the pumping means 220 and includes a heat sink layer 228, a heated layer 234, and a portion 212a of the passageway sandwiched therebetween. The vaporizing apparatus 71 can sustain a floe of organosilicon vapor at a flow rate of about 1 to about 100 SCCM for as long as desired.</p> |
申请公布号 |
EP0299753(A2) |
申请公布日期 |
1989.01.18 |
申请号 |
EP19880306432 |
申请日期 |
1988.07.13 |
申请人 |
THE BOC GROUP, INC. |
发明人 |
FELTS, JOHN T.;HOFFMAN, ROBERT R.;HOFMAN, JAMES J. |
分类号 |
C09D183/00;B01D1/00;C23C16/448 |
主分类号 |
C09D183/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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