| 摘要 |
PURPOSE: To obtain thermally and chemically excellent characteristics by incorporating an epoxy resin which is hardened by heat, an urea or imidazole latent curing agent for this resin and a specified iron-allene complex. CONSTITUTION: This positive photoresist contains an epoxy resin which can be cured by heat, an urea or imidazole latent curing agent for this resin, and an iron-allene complex expressed by formula I. In formula I, (n) is 1 or 2, (m) is 1 to 5, X is a non-nucleophilic anion, R<1> is aπ-allene, and R<2> is an anion ofπ-allene. Thereby, thermally and chemically excellent characteristics can be obtd.
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