发明名称 FABRICATION METHOD OF MEMBRANE STRUCTURE
摘要 A thin film which becomes a membrane is formed over one major surface of a substrate by a plasma deposition process utilizing microwave electron cyclotron resonance. The substrate is then removed, other than a portion of the substrate which remains as a frame, so as to form a membrane structure. A dense and high quality membrane is formed at a low temperature and the internal stress of the membrane controlled by varying the conditions under which the plasma deposition process is carried out and by heat treating the thin film after its formation.
申请公布号 EP0103280(B1) 申请公布日期 1988.12.28
申请号 EP19830108897 申请日期 1983.09.08
申请人 NIPPON TELEGRAPH AND TELEPHONE CORPORATION 发明人 MATSUO, SEITARO;KIUCHI, MIKIHO;SEKIMOTO, MISAO
分类号 G03B42/02;C23C16/50;C23C16/511;G03F1/00;G03F1/54 主分类号 G03B42/02
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