| 摘要 |
PURPOSE:To execute sputtering more uniformly on a target surface and to improve the efficiency of using the target by disposing a guide for magnetic lines of force so as to face the surface of magnetic poles and to extend in the direction of the target on the main plane of a backing plate. CONSTITUTION:Magnets 4 which set magnetic fields are disposed in the central part and periphery and the guide 10 for magnetic lines of force consisting of silicon iron or the like having a convergent rectangular shape in section and high magnetic permeability is disposed on the main plane of the backing plate 1 in the position above the magnets 4. The target 3 is provided between the main plane of said plate 1 and the magnets 4. The thickness of the target 3 and the height of the guide 10 are nearly equaled to each other. The magnetic lines of force generated by the magnets 4 are curved by the guide 10 and are more paralleled with the surface of the target 3 so that the sputtering is executed more uniformly on the surface of the target 3. The target 3 is consumed widely overall and the efficiency of using the target is exceedingly improved by this constitution. |
