| 摘要 |
PURPOSE:To cause a reaction for the formation of a thin film on a large-area substrate at high speed by a method wherein a plasma stream is generated by a microwave discharge by electron cyclotron resonance using a metal cylinder equipped with a slit. CONSTITUTION:A microwave transmitted by a microwave transmitter 100 is taken out by a ball antenna 109 via a waveguide 102; it is propagated through a coaxial tube 110 and reaches a metal tube 113 equipped with a slit. A standing wave is formed on the slit; a plasma is generated by electron cyclotron resonance due to a magnetic field generated by a magnetic coil 214 surrounding the metal cylinder 113 equipped with the slit. During this process, the metal cylinder equipped with the slit is housed in a plasma generation chamber; this plasma generation chamber 204 is interlinked with a reaction container 208; accordingly, the generated plasma can be taken out in the reaction container 208. The inside of the reaction container is evacuated by using an evacuation device; at the same time, a prescribed gas is supplied by a gas supply device; an ECR (electron cyclotron resonance) plasma reaction is caused. By this setup, it is possible to form a large-area film of high quality at high speed.
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