发明名称 |
Photosensitive composition. |
摘要 |
<p>A photoresist pattern exhibiting high resolution for an i-line exposure and having a steep sectional profile can be formed by making use of a photosensitive composition comprising a cresol novolac resin and a sensitizer blended therewith wherein(i) the cresol novolac resin has a meta to para ratio of 50/50 to 70/30 and a standard polystyrene equivalent weight-average molecular weight of 5,000 to 50,000 and(ii) the sensitizer comprises an ester of 1-oxo-2-diazonaphthoquinone-5-sulfonic acid with 2,3,4-trihydroxybenzophenone and/or an ester of 1-oxo-2-diazonaphthoquinone-5-sulfonic acid with 2,3,4,4 min -tetrahydroxybenzophenone and the content of said sensitizer is 14 to 35 % by weight based on said polymer compound.</p> |
申请公布号 |
EP0295626(A2) |
申请公布日期 |
1988.12.21 |
申请号 |
EP19880109468 |
申请日期 |
1988.06.14 |
申请人 |
HITACHI, LTD.;HITACHI CHEMICAL CO., LTD. |
发明人 |
TANAKA, TOSHIHIKO;HASHIMOTO, MICHIAKI;KOIBUCHI, SHIGERU;FUKUDA, HIROSHI;HASEGAWA, NORIO |
分类号 |
G03C1/72;G03F7/023 |
主分类号 |
G03C1/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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