DEVICE FOR FORMING OPTICAL EXCITATION FILM

摘要

PURPOSE:To prevent a defective deposited film from being formed by a method wherein a fixing and removing means of a discharging electrode as well as a discharging high voltage power supply are provided without exposing a film forming chamber to atmospheric air. CONSTITUTION:During the plasma-etching process and the sputter-etching process, the space between a film forming chamber 1 and a containing chamber 14 is partitioned by a discharging electrode sheet 16 which is fixed by chucks 17. The discharging electrode 16 fixed by chucks 17 is insulated from the film forming chamber 1 and the containing chamber 14 but connected to a discharging high voltage power supply 38 to impress the electrode sheet 16 with voltage. In other words, the film deposited on a substrate holder 3 and the chucks 17 is plasma-etched in the film forming chamber 1 to prevent any defective deposited film due to a peeled-off film from the substrate holder 3 and the chucks 17 from being formed further to plasma-etch and sputter-etch an oxide film on the surface of a metallic electrode on the substrate immediately before the film deposition so that the metallic electrode and a semiconductor film may be brought into an excellent ohmic contact.