| 摘要 |
PURPOSE:To observe the surface of a wafer and a projected reference line simultaneously by a microscope with an accurate focus by irradiating a glass surface with parallel rays from the upper section of a glass in parallel with an optical axis for the microscope and projecting the effect of a non-light-transmitting reference line on the glass surface onto the surface of the wafer. CONSTITUTION:A small window 5 is formed which is separate only by a regular interval from the position of the support of a probe group 4a on a support member 3 to which the probe group 4a in a probing head 4 is supported, the small window 5 is irradiated with parallel rays l1 by a light source 6 and a lens system 7 from the direction vertical to the surface of a wafer through a semitransparent mirror 8 in the upper section of the small window 5, and the image of a mark such as a cross line on a transparent plate is shaped onto the surface of the wafer. The image of the mark such as the cross line and a mark for confirming the position of the wafer such as pads on the surface of the wafer are observed by an optical microscope 9 from the upper section of the semitransparent mirror 8, and the relative positions of the probing head 4 and the wafer 2 are adjusted, thus positioning the tips of the probe group 4a and pad groups on the wafer 2 to be inspected. Accordingly, said image and mark for confirming the position of the wafer can be observed with an accu rate focus even by a microscope having high magnification, thus improving the precision of positioning. |
