发明名称 SI-B ALLOY DOPANT MATERIAL FOR PRODUCTION OF SI SINGLE CRYSTAL BY PULLING UP METHOD
摘要 PURPOSE:To extremely reduce segregation of B dope in an obtained Si single crystal rod and to uniform electric characteristics of wafer in production of Si single crystal by pulling method, by using a Si-B alloy dopant made of specific B. CONSTITUTION:In producing Si single crystal, a Si-B alloy for dopant material is constituted by using B comprising >=95wt.% <11>B, an isotope and <=5wt.% <10>B.
申请公布号 JPS63297211(A) 申请公布日期 1988.12.05
申请号 JP19870133985 申请日期 1987.05.29
申请人 MITSUBISHI METAL CORP 发明人 SAKAI KAZUHIRO;TSUNASHIMA MAKOTO;MIYAUCHI MASATO
分类号 C30B15/04;C01B35/02;C30B29/06 主分类号 C30B15/04
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