发明名称 |
Photo-solubilizable composition admixture with radiation sensitive acid producing compound and silyl ether group containing compound with either urethane, ureido, amido, or ester group |
摘要 |
A photo-solubilizable composition is disclosed, comprising (a) a compound capable of producing an acid upon being irradiated with actinic light rays, and (b) a compound containing at least one silyl ether group represented by formula (I) <IMAGE> (I) that is capable of being decomposed with an acid and at least one group selected from among a urethane group, a ureido group, an amido group, and an ester group, and, according to a preferred embodiment at least one hydrophilic group.
|
申请公布号 |
US4786577(A) |
申请公布日期 |
1988.11.22 |
申请号 |
US19850807937 |
申请日期 |
1985.12.12 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
AOAI, TOSHIAKI;KAMIYA, AKIHIKO |
分类号 |
G03C1/72;G03F7/039;G03F7/075;(IPC1-7):G03C1/495 |
主分类号 |
G03C1/72 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|