发明名称 Photo-solubilizable composition admixture with radiation sensitive acid producing compound and silyl ether group containing compound with either urethane, ureido, amido, or ester group
摘要 A photo-solubilizable composition is disclosed, comprising (a) a compound capable of producing an acid upon being irradiated with actinic light rays, and (b) a compound containing at least one silyl ether group represented by formula (I) <IMAGE> (I) that is capable of being decomposed with an acid and at least one group selected from among a urethane group, a ureido group, an amido group, and an ester group, and, according to a preferred embodiment at least one hydrophilic group.
申请公布号 US4786577(A) 申请公布日期 1988.11.22
申请号 US19850807937 申请日期 1985.12.12
申请人 FUJI PHOTO FILM CO., LTD. 发明人 AOAI, TOSHIAKI;KAMIYA, AKIHIKO
分类号 G03C1/72;G03F7/039;G03F7/075;(IPC1-7):G03C1/495 主分类号 G03C1/72
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