| 发明名称 |
MANUFACTURE OF DEVICE WITH STABLE BORON NITRIDE MASK BY X-RAY LITHOGRAPHY, STRUCTURE OF THE MASK AND SYSTEM OF MANUFACTURE OF DEVICE |
| 摘要 |
<p>A hydrogen-free boron-containing membrane (28) is a state of tension exhibits advantageous properties for use in a mask for X-ray lithography.</p> |
| 申请公布号 |
JPS63285932(A) |
申请公布日期 |
1988.11.22 |
| 申请号 |
JP19880104399 |
申请日期 |
1988.04.28 |
| 申请人 |
AMERICAN TELEPH & TELEGR CO <ATT> |
发明人 |
ROORANDO EE REBII |
| 分类号 |
C30B29/38;G03F1/22;H01L21/027 |
主分类号 |
C30B29/38 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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