| 摘要 |
PURPOSE:To prevent a resist from generation of stain by drying by using ethyl cellosolve for a final rinse. CONSTITUTION:Ethyl cellosolve is used as final rinse when a positive resist (e.g. acrylic resist) or a negative resist (e.g. styrenic resist) is developed with an org. solvent. By this method, there is no fear for generating stain by drying after using the final rinse, and a resist pattern contg. no surface defect is obtd. |
