| 摘要 |
PURPOSE:To form a film without infiltration of foreign matter and having high quality and high reliability by arranging a cylindrical substrate in a cylindrical electrode plate for glow discharge with the upper end closed, setting a cylindrical auxiliary base body on the substrate, and further setting an insulating member thereon. CONSTITUTION:The cylindrical electrode plate 2 for glow discharge with the upper end closed by an upper surface 2a is arranged in a reaction chamber 1 into which a film forming gas is introduced from an inlet 5. The cylindrical substrate 3 is placed on a carrier 4 in the chamber 1, and heated to a specified temp. by a heater 4a. A glow discharge is generated by a high-frequency power source 7 in the discharge space 14 between the electrode plate 2 and the substrate 3. The film forming gas injected toward the substrate 3 from the gas nozzle 6 of the electrode plate 2 is decomposed by the discharge, and a film is formed on the substrate 3. In this glow discharge decomposition device, the cylindrical auxiliary base body 18 is placed on the substrate 3, and the insulating member 19 is provided between the base body 18 and the upper end of the electrode plate 2. As a result, the abnormal discharge is prevented, a film can be uniformly formed, the deposition of foreign matter on the upper surface 2a of the electrode plate 2 is prevented, and the infiltration of foreign matter during film formation is prevented.
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