| 摘要 |
PURPOSE:To realize the stabilized leveling calibration with high speed, by inclining the projection image itself of a mask pattern so as to match the inclination of a photosensitive substrate surface. CONSTITUTION:A mask retaining member RH is provided, which can hold a mask (reticle) R with an inclination angle in an arbitray direction. The inclination of the mask retaining member RH is so controlled that the relative inclination amount between a specified region (shot region) surface on a photosensitive substrate W and the projection image surface of the pattern of the mask R can be calibrated so as to be approximately zero. When the surface of a projection region on the photosensitive substrate W undulates or inclines with a not allowable degree from a viewpoint of the focal depth and the curvature of field, the mask (reticle) R side is made to incline by the amount corresponding with the surface inclination. Thereby, the stabilized leveling calibration with high speed for each shot region is enabled. |
