发明名称 PLASMA TREATMENT DEVICE
摘要 PURPOSE:To execute a large-diameter and uniform plasma treatment by a method wherein an electric current to be made to flow through a a second solenoid coil arranged under a first solenoid coil and through a third solenoid coil is controlled time- wise and the electric currents whose phases differ from each other is made to flow in succession through each coil of these solenoid coils so that the straight-line motion or the rotary motion of a plasma flow is executed in a wide region. CONSTITUTION:A plasma generation part 1A is equipped with the followings: a glass tube 2 for plasma generation use; a first solenoid coil 4 connected to a direct-current power supply 3; a second solenoid coil 6; a high-frequency waveguide 7; a magnetron 9 connected to a driving power supply 8; and a third solenoid coil 17 arranged on the side of a substrate of the second solenoid coil 6. A power supply 5A is connected to the second solenoid coil 6 and the third solenoid coil 17; if the electric currents to be made to flow through these solenoid coils are controlled time-wise and the electric currents whose phases differ from each other are made to flow in succession through each coil, a magnetic field which is rotated with uniform magnitude is generated. By this setup, a uniform plasma treatment is executed even on a large-diameter substrate and the highly accurate substrate is obtained.
申请公布号 JPS63250127(A) 申请公布日期 1988.10.18
申请号 JP19870083865 申请日期 1987.04.07
申请人 MITSUBISHI ELECTRIC CORP 发明人 MINAMI TOSHIHIKO;NAKANISHI KOICHIRO;ODERA HIROKI;HANAZAKI MINORU
分类号 H01L21/302;H01L21/205;H01L21/3065;H01L21/31 主分类号 H01L21/302
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