发明名称 X-RAY EXPOSURE APPARATUS
摘要 PURPOSE:To perform exposure with pseudo-parallel X rays having high output power, by reflecting the X rays, which are generated in a thin tube type plasma X-ray source with a reflecting mirror having a quadratic surface, and performing exposure with the X rays, which are made to be the pseudo-parallel state through solar slits. CONSTITUTION:Plasma 5 is generated in a fine tube shaped space 2 by creeping discharge along the surface of the wall constituting the thin tube shaped space 2. Thus X rays 7 are generated in a thin tube type X-ray generating means OR. A refrecting mirror 26 has a quadratic surface and is provided so that the focal point is positioned at a tip part P of said thin tube shaped space 2. The X rays, which are generated in the X-ray generating means OR and reflected with the reflecting mirror 26, are made to be a pseudo-parallel state through solar slits 20. The X rays, which are made to be the pseudo-parallel state through the solar slits 20, are projected on a pattern of an original sheet 22 and the image of the pattern 23 is transferred to a light sensitive body 24 on a substrate 25. For example, the fine tube shaped space 2 is formed by surrounding a plurality of insulators 8. The surface of the insulator 8 facing the space is covered with a dielectric sheet 9.
申请公布号 JPS63239943(A) 申请公布日期 1988.10.05
申请号 JP19870071709 申请日期 1987.03.27
申请人 CANON INC 发明人 AMAMIYA MITSUAKI
分类号 G03F7/20;H01L21/027;H01L21/30 主分类号 G03F7/20
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