发明名称 Process and composition for drying of gaseous hydrogen halides.
摘要 <p>A process for drying a gaseous hydrogen halide of the formula HX, wherein X is selected from the group consisting of bromine, chlorine, fluorine, an iodine, to remove water impurity therefrom, comprising: contacting the water impurity-containing gaseous hydrogen halide with a scavenger including a support having associated therewith one or more members of the group consisting of: (a) an active scavenging moiety selected form one or more members of the group consisting of: (i) metal halide compounds dispersed in the support, of the forumla MXy; and (ii) metal halide pendant functional groups of the formula -MXy-1 covalently bonded to the support, wherein M is a y-valent metal, and y is an integer whose value is from 1 to 3; (b) corresponding partially or fully alkylated compounds and/or pendant functional groups, of the metal halide compounds and/or pendant functional groups of (a); wherein the alkylated compounds and/or pendant functional groups, when present, are reactive with the gaseous hydrogen halide to form the corresponding halide compounds and/or pendant functional groups of (a); and M being selected such that the heat of formation, DELTA Hf of its hydrated halide, MXy . (H2O)n, is governed by the relationship: DELTA Hf>/= n x 10.1 kilocalories/mole of such hydrated halide compound wherein n is the number of water molecules bound to the metal halide in the metal halide hydrate. Also disclosed is an appertaining scavenger composition and a contacting apparatus wherein the scavenger is deployed in a bed for contacting with the water impurity-containing gaseous hydrogen halide.</p>
申请公布号 EP0283965(A2) 申请公布日期 1988.09.28
申请号 EP19880104393 申请日期 1988.03.18
申请人 ADVANCED TECH MATERIALS 发明人 TOM, GLENN M.;BROWN, DUNCAN W.
分类号 B01D53/28;B01J20/02;B01J20/22;C01B7/00;C01B7/07;C01B7/09;C01B7/13;C01B7/19;C01G1/06 主分类号 B01D53/28
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