| 摘要 |
PURPOSE:To enable execution of stable and highefficient polishing, by a method wherein, when a workpiece is polished in an immersed state in a polishing agent, by agitating the polishing agent, desired polishing grain size distribution is formed in the polishing agent, and a polishing position is polished as polishing particle having a desired grain size is fed. CONSTITUTION:The desired grain size of polishing grain in a polishing agent 40 is set, and a set value is inputted to a control device 56 for memory. Based on a drive command from the control device 56, an ultrasonic oscillator 42 oscillates at a first amplitude to agitate a polishing agent 40 to form first grain size distribution where polishing grain with a high grain size is situated in a low position and a polishing grain with a low grain size in a high position. The part to be polished of a workpiece 60 is set, a polishing agent in a polishing position level is taken in through a polishing agent intake pipe 46a to measure a grain size, and when the measurement is a desired grain size, polishing is effected. During polishing, by means of a command from the control device 56, a motor 32 is run to rotate a polishing tool 34. After polishing of a desired position is completed, a similar motion is made on a subsequent position to be polished, and through repetition of movement in directions (x) and (y) of the polishing tool, the workpiece can be uniformly polished. |
