发明名称 EXPOSURE SYSTEM
摘要 PURPOSE:To enable stable exposure with appropriate quantity of light for a long time by increasing or reducing the diameter of a laser light beam by monitoring the variation of the quantity of laser light from the set quantity of light according to the detected output of the laser light. CONSTITUTION:When laser light is transmitted from an excimer laser equipment 10, the laser light is detected by a photodetector 100 provided behind a reflecting mirror 42 and the information of the light is sent to a quantity-of-light monitor 110. When the monitored quantity of light by the quantity of light monitor 110 is less than a set value, a controller 120 sends an instruction to reduce the diameter of a laser beam to a beam diameter increasing or reducing unit 20 and the diameter of the laser beam is reduced according to the instruction. When the diameter of the laser beam is reduced, the density of the quantity of light is increased. When the quantity of light by the quantity of light monitor 110 is more than the set value, the diameter of the laser beam is increased by the beam diameter increasing or reducing unit 20, so the quantity of light is reduced.
申请公布号 JPS63213927(A) 申请公布日期 1988.09.06
申请号 JP19870046783 申请日期 1987.03.03
申请人 NIKON CORP 发明人 HIKIMA IKUO;MIYAJI AKIRA
分类号 H01L21/30;G03F7/20;H01L21/027 主分类号 H01L21/30
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