| 发明名称 |
COPOLYMERS HAVING O-NITROCARBINOL ESTER GROUPS, PRODUCTION OF TWO-LAYER RESISTS, AND FABRICATION OF SEMICONDUCTOR COMPONENTS |
| 摘要 |
Copolymers useful in particular for producing two-layer resists and fabricating semiconductor devices contain from 5 to 50 mol % of monomers having o-nitrocarbinol ester groups, from 95 to 50 mol % of an olefinically unsaturated silicon-containing organic compound, from 0 to 20 mol % of an olefinically unsaturated carboxylic acid and from 0 to 25 mol % of other copolymerizable monomers. |
| 申请公布号 |
AU1070788(A) |
申请公布日期 |
1988.09.01 |
| 申请号 |
AU19880010707 |
申请日期 |
1988.01.22 |
| 申请人 |
BASF A.G. |
发明人 |
REINHOLD SCHWALM;HORST BINDER |
| 分类号 |
G03C1/72;C08F20/34;C08F30/08;C08F220/26;C08F220/36;C08F222/22;C08F230/08;G03F7/039;G03F7/095;G03F7/11;H01L21/027;H01L21/30 |
主分类号 |
G03C1/72 |
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