| 摘要 |
The invention relates to solvent systems which are based on water-soluble amino derivatives and propylene glycol components, for removing photoresists. These solvent systems are comprised of (a) from about 10 to 100% by weight of at least one water-soluble amine of the general formula <IMAGE> in which R1, R2, R3, R4 denote H or alkyl groups n,m denote 0 to 2, and o denotes 1 to 3; and (b) from about 0 to 90% by weight of at least one water-soluble propylene glycol derivative of the general formula <IMAGE> in which R3, R4 denote H, alkyl or <IMAGE> and P denotes 1 to 3.
|
