发明名称 HIGH SPEED AQUEOUS DEVELOPABLE RADIATION-SENSITIVE COMPOSITION AND PRINTING PLATE CONTAINING SAME
摘要 <p>A negative-working radiation-sensitive composition, comprising a mixture of a condensation polymer (A) having recurring units derived from (a) 1,4-bis(β-hydroxyethoxy)cyclohexane and (b) diethyl-p-phenylenediacrylate; and a condensation polymer (B) having recurring units derived from (a), (b) and (c) dimethyl-3,3'-[sodioimino)disulfonyl]dibenzoate present in a weight ratio of A to B of from about 1:1 to about 9:1, and wherein units derived from (c) are present in an amount less that 1 mole % based on the total units in the polymer mixture, is particularly useful in preparing a printing plate which develops cleanly in an aqueous developer and exhibits improved speed and good incubation stability.</p>
申请公布号 WO1988005929(A1) 申请公布日期 1988.08.11
申请号 US1988000192 申请日期 1988.01.26
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