| 摘要 |
<p>PURPOSE:To subject the surface of a substrate to uniform plasma treatment by providing connecting rods for penetrating a pair or more electrode plates and holding the intervals between the electrodes constant in case of introducing gas into a closed vessel equipped with a pair or more the electrode plates and performing plasma treatment. CONSTITUTION:A plurality of anodic graphite plates 7A and cathodic graphite plates 7B are alternately arranged at constant intervals on a quartz boat 7 placed into a quartz tube 1 and two connecting rods 10A for anodic plates 7A and two connecting rods 10B for cathodic plates 7B are penetrated therethrough. In this case, naturally the connecting rods 10A are electrically connected with the anodic graphite plates 7A and insulated from the cathodic graphite plates 7B with insulating sleeves 11. Two connecting rods 10A, 10A and two connecting rods 10B, 10B are connected respectively with connecting plates 15. Further the intervals between both graphite plates can be regulated with screw threads 12 provided on the connecting rods. Since both electrode plates are freely held at constant interval in such a way, treatment such as etching and deposition resulting from plasma on the surfaces of substrate 2 like wafers fitted to graphite plates is always performed uniformly.</p> |
