发明名称 METHOD AND INSTRUMENT FOR MEASURING DEPTH OF ETCHING
摘要 PURPOSE:To increase the quantity of variation of a detection signal and to measure depth with high reliability by calculating the light intensity ratio of out-of-phase reflection diffracted light beams from the surface of a body to be inspected which has an etched part and counting the number of times of repetition of the intensity ratio. CONSTITUTION:Laser light from a coherent light source 1 is incident on the inspected surface of the object body 4 at right angles from a window 12 after being reflected by a mirror 2 and a half-mirror 3 based on cycles of the unevenness of etched parts and unetched parts of the inspected surface. The diffracted light beams of 0th order and 1st order are incident on detectors 5 and 6 after passing through the half-mirror 3. Light intensity signal from the detectors 5 and 6 are inputted to a subtracter 8 to calculate the intensity ratio of the light of 1st order to the light of 0th order. A calculator 9 counts the number of times of repetition of variation in intensity ratio from the intensity ratio. A controller 10 compares the number of times of repetition with a set value and controls a high frequency power source 15 so that etching is finished when the number of times reaches the set value.
申请公布号 JPS63175703(A) 申请公布日期 1988.07.20
申请号 JP19870008461 申请日期 1987.01.17
申请人 MITSUBISHI ELECTRIC CORP 发明人 YAMAMOTO YOKO;TANAKA HITOSHI
分类号 H01L21/66;G01B11/22;H01L21/302;H01L21/3065 主分类号 H01L21/66
代理机构 代理人
主权项
地址