发明名称 |
METHOD AND INSTRUMENT FOR MEASURING DEPTH OF ETCHING |
摘要 |
PURPOSE:To increase the quantity of variation of a detection signal and to measure depth with high reliability by calculating the light intensity ratio of out-of-phase reflection diffracted light beams from the surface of a body to be inspected which has an etched part and counting the number of times of repetition of the intensity ratio. CONSTITUTION:Laser light from a coherent light source 1 is incident on the inspected surface of the object body 4 at right angles from a window 12 after being reflected by a mirror 2 and a half-mirror 3 based on cycles of the unevenness of etched parts and unetched parts of the inspected surface. The diffracted light beams of 0th order and 1st order are incident on detectors 5 and 6 after passing through the half-mirror 3. Light intensity signal from the detectors 5 and 6 are inputted to a subtracter 8 to calculate the intensity ratio of the light of 1st order to the light of 0th order. A calculator 9 counts the number of times of repetition of variation in intensity ratio from the intensity ratio. A controller 10 compares the number of times of repetition with a set value and controls a high frequency power source 15 so that etching is finished when the number of times reaches the set value.
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申请公布号 |
JPS63175703(A) |
申请公布日期 |
1988.07.20 |
申请号 |
JP19870008461 |
申请日期 |
1987.01.17 |
申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
YAMAMOTO YOKO;TANAKA HITOSHI |
分类号 |
H01L21/66;G01B11/22;H01L21/302;H01L21/3065 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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