发明名称 Ballistic hetero-junction transistor with transverse two dimensional electron gas layer
摘要 The invention relates to a semiconductor device of the hetero-junction transistor type comprising a stack of semiconductor layers which in combination constitute the source, drain and gate regions, while the current path between the source and drain regions is substantially at right angles to the various junctions. The gate region constitutes an electron accumulation region in the form of a two-dimensional quasi Fermi-Dirac gas which can be brought to the desired polarization potential of at least one gate electrode, while the electrons forming the source-drain current traverse this electron cloud without having a strong interaction with it, in ballistic or quasi-ballistic conditions.
申请公布号 US4758868(A) 申请公布日期 1988.07.19
申请号 US19870112030 申请日期 1987.10.21
申请人 U.S. PHILIPS CORPORATION 发明人 FRIJLINK, PETER M.
分类号 H01L29/80;H01L21/331;H01L21/338;H01L29/201;H01L29/205;H01L29/73;H01L29/76;H01L29/778;H01L29/812;(IPC1-7):H01L29/161 主分类号 H01L29/80
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