发明名称 |
Conductive pattern producing method and its applications. |
摘要 |
<p>An improved method of forming an electrode pattern on a substrate (1) is described. The substrate is coated with a first conductive film (2a) and subjected to baking. On the first conductive film is then overlied a second conductive film (2) which mends possible fissures of the first conductive film which, besides, would produce open circuits in the pattern.</p> |
申请公布号 |
EP0272678(A2) |
申请公布日期 |
1988.06.29 |
申请号 |
EP19870118977 |
申请日期 |
1987.12.21 |
申请人 |
SEL SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
MASE, AKIRA |
分类号 |
H01L21/60;G02F1/13;G02F1/1343;G02F1/1345;H01L21/48;H05K1/09;H05K3/24 |
主分类号 |
H01L21/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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