发明名称 Conductive pattern producing method and its applications.
摘要 <p>An improved method of forming an electrode pattern on a substrate (1) is described. The substrate is coated with a first conductive film (2a) and subjected to baking. On the first conductive film is then overlied a second conductive film (2) which mends possible fissures of the first conductive film which, besides, would produce open circuits in the pattern.</p>
申请公布号 EP0272678(A2) 申请公布日期 1988.06.29
申请号 EP19870118977 申请日期 1987.12.21
申请人 SEL SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 MASE, AKIRA
分类号 H01L21/60;G02F1/13;G02F1/1343;G02F1/1345;H01L21/48;H05K1/09;H05K3/24 主分类号 H01L21/60
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