| 摘要 |
PURPOSE:To enable a doping or a plasma treatment of impurities extremely uniform to a large area sample to be available by providing a magnetic field generating source generating a magnetic field having an orthogonal component to an electric field to which high frequency electrode is impressed in the outside of a vacuum tank. CONSTITUTION:One side of a capacity coupling type high frequency glow discharge electrode 31 connects with a high frequency oscillator 33 via a matching box 32, and another side of the first conductive net 34 is earthed and supplies a high frequency electric power to a vacuum tank inside. Furthermore, an excitation and a confinement of an electron rotation movement are conducted by a magnetic field impressed by a electromagnet 35 arranged in the vacuum tank C outside, and plasma is made to generate stably. A charged particle beam 44 drawn out from plasma uniformly produced between the electrode 31 and a conductive net 34 and obtained a kinetic energy corresponding to an electric potential difference between the second conductive net 36 and a substrate stand 37 is irradiated to a sample 41 on the substrate stand 37. This enables a doping or a plasma treatment of impurities extremely uniform to a sample to be available.
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