| 摘要 |
An improved interferometer is provided which is of simplified construction and gives enhanced, accurate interference analysis through provision of an alterable masking device located at the interference plane which facilitates rapid computer analysis of an interference pattern. The interferometer of the invention preferably includes a source of electromagnetic radiation, a beam splitter, a lens for convergence and interference of the beams, a masking device located at the region of beam convergence, and detection apparatus for receiving and analyzing radiation from the mask. The mask is preferably stationary and electrically alterable and advantageously includes a base along with separate, plural masking structures mounted on one base face with electrical connections coupled to the separate masking structures. The masking structures are formed of a crystalline or polycrystalline thermo or electro diachromatic substance such as vanadium dioxide which has different opacity characteristics to electromagnetic radiation upon selective application of electrical potential thereto. In use, electrical potential is applied to various subsets of the masking structures in a predetermined pattern so as to facilitate mathematical analysis of the generated interference patterns detected by the detection apparatus. The use of a masking device in the present invention allows the use of a small detector which thereby maximizes the signal-to-noise ratio of the detected interference pattern. The use of an electrically alterable mask avoids the need for selective physical repositioning of a masking device, and is specifically adapted for minicomputer control to achieve the most accurate, rapid results.
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