| 发明名称 |
Refractory metal silicide sputtering target |
| 摘要 |
A refractory metal silicide sputtering target is made by reacting refractory metal and silicon to about 70 to 90% completion of the reaction, comminuting the material, and then vacuum hot pressing the comminuted material to a high density compact.
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| 申请公布号 |
US4750932(A) |
申请公布日期 |
1988.06.14 |
| 申请号 |
US19860088620 |
申请日期 |
1986.12.18 |
| 申请人 |
GTE PRODUCTS CORPORATION |
发明人 |
PARENT, EDWARD D.;PURINTON, CHARLES S.;SUTTER, CHARLES W. |
| 分类号 |
C04B35/58;C22C29/18;C23C14/34;(IPC1-7):B22F1/00 |
主分类号 |
C04B35/58 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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