| 摘要 |
In a mask for photolithographically producing a structure, in particular for producing printed circuit boards and liquid-crystal cells, an electrically conductive UV-transparent semiconductor layer, preferably an indium tin oxide (ITO) layer is applied to a glass plate. A metal layer which represents the structure to be produced is arranged on the indium tin oxide layer. Preferably, the metal layer is composed of copper. <IMAGE> |
