| 摘要 |
PURPOSE:To improve dimensional stability of the positive type photoresist by incorporating curcumin to said positive type photoresist. CONSTITUTION:The curcumin is incorporated into the positive type photoresist. The positive type photoresist is not limitted, but, is selected from the positive type photoresists which are usually used. The preferable positive type photoresist is composed of a photosensitive substance and a film forming substance. The photosensitive substance is exemplified by a compd. contg. a quinone diazide group, for example, a partial ester or a complete ester or a partial amide or a complete amide of a sulfonic acid of a quinone diazide and a compd. having a phenolic hydroxy group or an amino group. Said quinone diazide is exemplified by for example, orthobenzoquinone diazide, orthonaphthoquinone diazide and orthoanthraquinone diazide, etc. Thus, the dimensional stability of the resist pattern against exposure is remarkably improved. |
