发明名称 |
Process for the treatment of an article in a highly clean atmosphere and container for implementing this process |
摘要 |
Process for the treatment of articles such as silicon wafers, and a container for implementing this process. Inside a room of intermediate cleanliness, the wafers 24 are kept inside a container 72 in which the atmosphere is of very high cleanness by virtue of a fan 84 which circulates air through an absolute filter 100. This container 72 can be used for transferring the wafers 24 by virtue of a nozzle 104 which can enter the nozzle 105 of larger section of another container 74 of the same type, placed on a machine 76. A rod 110 makes it possible to transfer the basket of wafers 14 from the first container 72 to the lift 80 of the machine 76. Application to the microelectronics industry. <IMAGE>
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申请公布号 |
FR2607406(A1) |
申请公布日期 |
1988.06.03 |
申请号 |
FR19860016653 |
申请日期 |
1986.11.28 |
申请人 |
COMMISSARIAT A ENERGIE ATOMIQUE |
发明人 |
JEAN-PIERRE LAZZARI;HENRI CORTIAL |
分类号 |
B65G51/02;B65G1/00;B65G1/02;B65G49/00;B65G49/07;F24F3/16;F24F7/06;H01L21/677;(IPC1-7):B01L1/04;B25J21/00;B08B15/00 |
主分类号 |
B65G51/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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