发明名称 PRODUCTION OF GLASS
摘要 PURPOSE:To obtain homogeneous and high-quality quartz glass by drying the specified wet gel to produce dry gel and holding this gel at prescribed temp. and thereafter sintering it. CONSTITUTION:Wet gel is produced by allowing a sol soln. obtained by mixing both a first soln. contg. fine silica particles which are obtained by hydrolyzing alkylsilicate with a basic reagent and a second soln. which is obtained by hydrolyzing alkylsilicate with an acidic reagent to gel. Then after drying the above- mentioned wet gel to produce dry gel, this dry gel is subjected to pretreatment holding it at 300-500 deg.C for 10hr or more and sintered to obtain aimed glass. By the above-mentioned production, the amount of ammonium chloride incorporated in a sample is decreased and foaming which is resulted from ammonium chloride as a cause can be made difficult-to be generated. Further obtained quartz glass is extremely high quality and can be applied as a photomask base plate for an IC and optical fiber or the like.
申请公布号 JPS63117918(A) 申请公布日期 1988.05.21
申请号 JP19860264247 申请日期 1986.11.06
申请人 SEIKO EPSON CORP 发明人 NAKAJIMA YOSHIHIRO
分类号 C03B37/016;C01B33/158;C03B8/02;C03B19/12 主分类号 C03B37/016
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