| 摘要 |
PURPOSE:To equalize a film forming rate with gas as a whole by supporting a susceptor for holding a material to be processed to a rotary drum at the periphery, and so disposing a heater in the drum as to uniformly heat the whole material to be processed. CONSTITUTION:Since a pinion 26 is rotatably driven by a drive unit 27 when a wafer is held by a susceptor 28, an internal gear 25 engaged therewith is driven, and a rotary drum 22 is concentrically rotated with respect to a body 21. As the drum 22 rotates, the susceptor 28 supported to the drum 22 is rotated with respect to the heater 13. Accordingly, a wafer 4 held on the susceptor 28 is uniformly heated by the heater 13 over the whole. Thus, a film forming rate with gas can be equalized as a whole, thereby uniformizing a film thickness distribution.
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