发明名称 |
Electron beam pattern line width measurement system |
摘要 |
Disclosed is an electron beam pattern line width measurement system wherein an electron beam is converged to a fine spot, the electron beam is scanned on a sample formed with a pattern to-be-measured, secondary electrons generated from a surface of the sample by the projection of the electron beam are detected, and the detected signal is processed to determine a line width of the pattern to-be-measured, comprising a secondary electron detector which detects a signal corresponding to an amount of all secondary electrons generated by the scanning, and a secondary electron energy analyzer which selectively detects a signal corresponding to an amount of secondary electrons of specified energy. With the electron beam pattern line width measurement system, it becomes possible to precisely detect a pattern boundary region defined by different sorts of materials in a stepped structure of a small level difference not having been measurable with a prior-art electron beam pattern line width measurement system.
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申请公布号 |
US4740693(A) |
申请公布日期 |
1988.04.26 |
申请号 |
US19850807681 |
申请日期 |
1985.12.11 |
申请人 |
HITACHI, LTD. |
发明人 |
NAKAYAMA, YOSHINORI;OKAZAKI, SHINJI;OBAYASHI, HIDEHITO;ICHIHASHI, MIKIO |
分类号 |
G01S13/74;G01B7/02;G01B15/00;H01J37/28;(IPC1-7):G01B7/14 |
主分类号 |
G01S13/74 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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