发明名称 BASE PRECURSOR FOR THERMODEVELOPING PHOTOSENSITIVE MATERIAL
摘要 PURPOSE:To form a thermodeveloping photosensitive material which is extremely stable at an ordinary temp., and releases a basic component by decomposing quickly when heated to a certain temp. or above to form an image having a high S/N ratio and a high image density, by using a base precursor expressed by the specific formula. CONSTITUTION:A base precursor expressed by the formula I or II is used. R in the above formula denotes a hydrogen atom, alkyl group, substd. alkyl group, cycloalkyl group, alkenyl group, alkinyl group, aryl group, substd. aryl group, heterocyclic residue, substd. heterocyclic residue, aralkyl group, substd. aralkyl group, acyl group, alkoxycarbonyl group, carbamoyl group, substd. carbamoyl group, univalent residue or alkylene group selected from -CO2M (M is an alkali metal) and -CO2H.B, an arylene group, and heterocyclic divalent residue. Be denotes an org. base. (x) denotes 1 when B is a monoacid base and 2 when a diacid base. (y) denotes 2 when B is a monoacid base and 1 when a diacid base.
申请公布号 JPS59180537(A) 申请公布日期 1984.10.13
申请号 JP19830055700 申请日期 1983.03.31
申请人 FUJI SHASHIN FILM KK 发明人 SATOU KOUZOU;HIRAI HIROYUKI
分类号 C07C51/347;C07C57/18;C07C57/20;C07C57/22;C07C57/26;C07C57/42;C07C57/52;C07C57/60;C07C59/64;C07C59/76;C07C59/84;C07C205/56;C07D211/26;C07D211/58;C07D211/72;C07D213/55;C07D213/73;C07D213/74;C07D215/12;C07D233/06;C07D239/06;C07D263/56;C07D277/40;C07D277/64;C07D333/24;C07D333/28;G03C1/06;G03C1/42;G03C1/498;G03C1/52;G03C1/61;G03C5/18;G03C8/40 主分类号 C07C51/347
代理机构 代理人
主权项
地址