发明名称 THIN-FILM EL DEVICE
摘要 <p>A thin-film EL device of which the surface is coated with a protective film of a two-layer structure consisting of an insulating film (10) and a metallic film (20) in order to obtain good air-tightness and high reliability. The insulating film (10) consists of any one of a silicon oxide film, a silicon nitride film, an aluminum oxide film or a tantalum oxide film, and the metallic film consists of a thin film of either aluminum or tantalum.</p>
申请公布号 WO1988002209(P1) 申请公布日期 1988.03.24
申请号 JP1987000691 申请日期 1987.09.18
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