ETCHING FOR FILM CONTAINING SEMICONDUCTOR ELEMENT,申请号JP19860164482-传众专利搜索

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发明名称	ETCHING FOR FILM CONTAINING SEMICONDUCTOR ELEMENT
摘要
申请公布号	JPS6319825(A)	申请公布日期	1988.01.27
申请号	JP19860164482	申请日期	1986.07.11
申请人	FUJITSU LTD	发明人	OGAWA TSUTOMU;NIWAYAMA NOBUO
分类号	H01L21/302;H01L21/306;H01L21/3065	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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