发明名称 |
PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PLATE |
摘要 |
PURPOSE:To enhance sensitivity, to facilitate synthesis, and to stabilize quality by incorporating one of specified structural units in an acid-decomposable compound. CONSTITUTION:The photosensitive composition contains a compound capable of producing an acid on irradiation with acinic rays and the acid-decomposable compound having one structural unit represented by formula I in which X is C or H, and Y is C, and it may be same as or different from X. The use of the photosensitive composition thus obtained permits the lithographic plate provided with a photosensitive layer comprising it to have sensitivity high enough to be put to practical use. |
申请公布号 |
JPS6310153(A) |
申请公布日期 |
1988.01.16 |
申请号 |
JP19860155481 |
申请日期 |
1986.07.02 |
申请人 |
KONICA CORP;MITSUBISHI CHEM IND LTD |
发明人 |
NAKAI HIDEYUKI;GOTO SEI;SASA NOBUMASA;URANO TOSHIYOSHI;MURAKAMI SACHIKO |
分类号 |
G03C1/72;G03F7/004;G03F7/039 |
主分类号 |
G03C1/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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