发明名称 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PLATE
摘要 PURPOSE:To enhance sensitivity, to facilitate synthesis, and to stabilize quality by incorporating one of specified structural units in an acid-decomposable compound. CONSTITUTION:The photosensitive composition contains a compound capable of producing an acid on irradiation with acinic rays and the acid-decomposable compound having one structural unit represented by formula I in which X is C or H, and Y is C, and it may be same as or different from X. The use of the photosensitive composition thus obtained permits the lithographic plate provided with a photosensitive layer comprising it to have sensitivity high enough to be put to practical use.
申请公布号 JPS6310153(A) 申请公布日期 1988.01.16
申请号 JP19860155481 申请日期 1986.07.02
申请人 KONICA CORP;MITSUBISHI CHEM IND LTD 发明人 NAKAI HIDEYUKI;GOTO SEI;SASA NOBUMASA;URANO TOSHIYOSHI;MURAKAMI SACHIKO
分类号 G03C1/72;G03F7/004;G03F7/039 主分类号 G03C1/72
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