| 摘要 |
PURPOSE:To set conditions and perform the inspection easily by a method wherein test patterns which have smaller widths than the patterns constituting a semiconductor circuit are formed on a semiconductor substrate to carry out the inspection. CONSTITUTION:A plurality of test patterns 6-9 which have smaller widths than the patterns constituting a semiconductor device are formed on a mask substrate 5. Then, a photosensitive resin film 12 is formed on a film 11 to be etched formed on a semiconductor substrate and selectively exposed with the mask 5. Then development is performed to transcribe and form patterns on the film 12. If the optimum conditions are achieved, aperture patterns 6A-9A are formed in the film 12 by the transcription of the patterns 6-9. On the other hand, if the optimum conditions are not conformed to, the aperture patterns 7B-9B are formed and the aperture corresponding to the pattern 6 is not formed because of the non-coformity of the conditions. With the inspection method described above, the conditions can be set and the inspection can be performed easily by inspecting whether the pattern corresponding the critical pattern width is formed or not.
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