| 摘要 |
A plasma reactor comprises a working chamber, the chamber being adapted to receive at least one article and a volume of plasma which is capable of interacting with a material of the article. A pair of electrodes are positioned about the chamber. Further, a radio-frequency generator is provided. More particularly, the plasma reactor includes a radio-frequency voltage transformer. The transformer includes a primary winding that is connected to the generator and a secondary winding the center of which is grounded. The secondary winding is adapted to transform the energy received from the primary winding into plasma-exciting energy at the electrodes, whereby the voltage between the plasma and the ground is small such that voltage discharge between the plasma and any grounded parts is minimized. The plasma reactor can be used to strip photoresist, etch silicon dioxide, aluminum and polysilicon from semiconductor wafers. It may also be used to clean organic scums, films or epoxy glass from circuit boards and magnetic recording discs. With ammonia as the plasma, the reactor can be used to case harden alloys.
|
