| 摘要 |
PURPOSE:To enable a large area region of X-ray mask patterns irradiated with X-rays to be transferred to a substrate with high precision, by providing a plurality of X-ray generating sources and providing shield plates between the X-ray generating sources such that X-rays generated by said X-ray generating sources are not applied to the same point on the substrate repeatedly. CONSTITUTION:X-ray sources 10 and 11 apply electronic beams 16 for example to metallic targets 17 and 18 so that X-rays are radiated radially from the regions of the targets where the electronic beams have been applied. Shield plates 12, 13 and 14 are formed of a material which is thick enough to block X-rays belonging to the photosensitive region of a photosensitive resin film 20 on a substrate 19 disposed on a substrate base 15, and the shield plates are arranged such that any point of the substrate 19 is not irradiated with X-rays from both of the sources 10 and 11 repeatedly. A region to be irradiated with X-rays from one X-ray source corresponds to an area of one or more chips of a semiconductor device. The X-ray sources are arranged movably always on the central axis of the shield plates, The flatness of an X-ray mask may be corrected by contacting the X-ray mask with the ends of the sheild plates. |
