发明名称 PLASMA CONTROLLER
摘要 PURPOSE:To impress a voltage in the waveform of frequency components over a wide range on an electrode by grounding the electrode through a resistor, connecting a high-frequency electric power source to the resistor, and separately providing the specified electric circuit for generating plasma. CONSTITUTION:Since a capacitor 8 connected to the electrode 3 has a low impedance against the frequency of the high-frequency power source 4, plasma 9 is generated between the electrodes 2 and 3 when a high-frequency electric power is impressed on the electrode 2 from the power source 4, and an article 1 is etched. At this time, the circuit constant of a matching circuit 5 is adjusted to stabilize the plasma 9, and discharge is maintained. Then when a high-frequency power is applied on the electrode 3 from a high-frequency power source 6, an electric current flows mostly to a resistor 7 since the capacitor 8 has a high impedance against the frequency fL of the power source 6, and a potential is generated on both ends. In this case, impedance matching can be obtained at all times irrespective of the frequency of the impressed power by selecting the resistance value of the resistor 7 against the frequency fL.
申请公布号 JPS62280378(A) 申请公布日期 1987.12.05
申请号 JP19860123341 申请日期 1986.05.30
申请人 HITACHI LTD 发明人 KAMIMURA TAKASHI;OTSUBO TORU
分类号 C23F4/00;H01L21/302;H01L21/3065 主分类号 C23F4/00
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