FORMING METHOD FOR PATTERN

摘要

PURPOSE:To prevent a conductive film interposed between resist films of two layers from charging up due to an electron beam by using a conductive material made of high molecular polycation-TCNQ salt complex for a material for forming the film to form a uniform film having no pinhole. CONSTITUTION:A high molecular polycation-TCNQ salt complex obtained by reacting high molecular polycation with lithium-TCNQ salt is utilized as a layer material to be interposed for discharging storage charge. The salt complex of the polycation and the TCNQ obtained by a Menschutkin reaction is of a conductive polymer compound which can form a uniform film without pinhole in an extremely reduced thickness by a spin coating method and has properties insoluble in a coating solvent of a resist for exposing an electron beam and a developer.