| 摘要 |
PURPOSE:To improve the miniaturization of a pattern and the yield of a product in a wet etching apparatus by circulating constant-temperature thermal medium generated in a constant temperature thermal medium generator to a heat exchange chamber surrounding an etching chamber to arbitrarily set a tempera ture in the chamber and to accurately hold the set temperature. CONSTITUTION:Holding means 16 for a work W to be etched is rotatably provided in an etching tank 1, and discharge means 2 for discharging an etchant to the work W to be etched, held and rotated by the means 16 is provided. A heat exchange chamber 14 disposed at an etching chamber 10 is provided in the tank 1 of this wet etching apparatus. Further, a constant-temperature thermal medium generator 7 is provided, connected through pipes 76, 77 with the chamber 14 to circulate the medium to the chamber 14. The means 2 is, for example, connected with an etchant vessel 3 through a feed tube 6 provided with a feed pump 4 and a temperature regulator 5.
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