| 摘要 |
<p>This invention relates to a method of forming silicon-containing hermetic coatings on light conducting devices, including optical fibers, wave guides, light pipes, or cables. By the present invention, a halosilane, halodisilane or mixture of halosilanes is thermally decomposed in the vapor phase in the presence of a light conducting device to produce a hermetic coating on the light conducting device.</p> |
