发明名称 NEGATIVE TYPE PHOTORESIST COMPOSITION
摘要 PURPOSE:To obtain the titled composition having a good coating characteristics such as flexibility by incorporating a specific N-(hydroxyphenyl)-maleimide copolymer, a novolak resin and a photosensitive aromatic azide compd. to the titled composition. CONSTITUTION:(1): The N-(hydroxyphenyl)-maleimide polymer polymerized from constitution units shown by formulas I, II, and III wherein R1 is aryl, 1-16C alkyl or cycloalyl grop, R2 is hydrogen atom or lower alkyl group, a ratio of (n), (l) and (m) satisfys the following formulas; 0.01<n/(l+m)<=10 and 0.1<l/(l+m)<=1. (2): The novolak resin is used for one component of the titled composition. (3): The photosensitive aromatic azide compd. is exemplified by the compd. contg. at least one of the aromatic azide group in one molecule, for example, 4-azidoenzal acetophenone, etc. The titled composition is obtd. by incorporating the compds. (1), (2) and (3), Thus, the photoresist composition having the excellent sticking property against a substrate and heat-resisting property is obtd.
申请公布号 JPS62255934(A) 申请公布日期 1987.11.07
申请号 JP19860099739 申请日期 1986.04.30
申请人 UBE IND LTD 发明人 TSUJIMOTO NOBUHIRO;SUZUKI MICHINORI
分类号 G03F7/012 主分类号 G03F7/012
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