| 摘要 |
PURPOSE:To enable a device to be easily adjusted, by detecting information signals coming from a referential pattern to be introduced to a cathoderay tube as brightness signals synchronized with scanning so that accuracy of lithography can be checked by states of patterns displayed on the cathode-ray tube. CONSTITUTION:A test sample 4 is provided with a referential pattern 20 in which elements minute in width are arranged at fixed intervals, and then data on a lithographic pattern, whose intervals are slightly different from those of the referential pattern 20, is provided. After the test sample 4 is set inside the lithography equipment, the referential pattern is scanned by means of a charged particle beam, depending on the data of the lithographic pattern. Information signals then coming from the referential pattern are detected to be introduced to a cathode-ray tube as brightness signals synchronized with this scanning, so that accurary of lithography can be checked from states of patterns displayed on the cathode-ray tube 18. Hence, highly accurate checking can be performed easily and quickly. |
